Self-aligned double patterning (SADP) is an alternative double-patterning process to the traditional litho-etch-litho-etch (LELE) approach used in most advanced production nodes. The main difference ...
MONTEREY, Calif. — ASML Holding NV has quietly inserted 193-nm immersion with double-patterning techniques on its roadmap, claiming that the technology is the “only” lithographic solution for the ...
Semiconductor Engineering sat down to discuss lithography and photomask trends with Uday Mitra, vice president and chief technology officer for the Etch Business Unit at Applied Materials; Pawitter ...
Michael White, director of product marketing, Calibre Physical Verification products, Mentor Graphics At the rate that new technology nodes keep racing by, it sure feels like we’re speeding down the ...
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