China’s EUV effort reached 13.5 nm light generation, with chips not yet produced, helping you gauge AI supply risk and timing ...
B, the first High-NA EUV lithography tool designed for commercial production, reiterating Intel's plans to use High-NA EUV ...
China just pushed the semiconductor fight into a new chapter. Inside a sealed compound in Shenzhen, scientists built a ...
The United States and its allies believed they had locked China out of the most critical technology needed to build ...
How Does EUV Lithography Work? EUV Lithography is a state-of-the-art technology in chip manufacturing that uses highly energetic ultraviolet light to carve detailed patterns onto semiconductor ...
IMEC has successfully demonstrated the full wafer-scale fabrication of nanopores using ASML’s state-of-the-art extreme ...
A California-based laboratory is set to lay the groundwork for the next evolution of extreme ultraviolet (EUV) lithography. Led by Lawrence Livermore National Laboratory (LLNL), the project aims for ...
In this artist's rendition, mirrors focus extreme ultraviolet light to pattern a latent image in a polymer thin film infiltrated by indium-containing gaseous molecules. For more than 50 years, the ...
A panel representing all aspects of the lithographic ecosystem talked about the future of EUV lithography on February 28th, during the SPIE Advanced Lithography + Patterning conference, in San Jose, ...