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A new cryogenic plasma etching technique developed by Japanese researchers dramatically accelerates semiconductor fabrication while cutting environmental impact, offering a potential breakthrough for ...
SAN FRANCISCO (Reuters) -The production process that Intel hoped would pave the way to winning manufacturing deals and restore its edge in churning out high-end, high-margin chips is facing a big ...
To continue reading this content, please enable JavaScript in your browser settings and refresh this page. Preview this article 1 min The semiconductor giant is ...
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